[PC-6-2] The Cleaning of Particle and Metallic Impurity on Si Wafer Surface by Fluorine Etchant

H. Izumi、M. Nose、S. Ojima、K. Kubo、T. Ohmi (1.Department of Electronics, Faculty of Engineering, Tohoku University)

https://doi.org/10.7567/SSDM.1995.PC-6-2