[S-I-1-2] In-Situ Observation of Oxygen Exposed Hydrogen Terminated Silicon Surfaces

Hiroki OGAWA、Kenji ISHIKAWA、Masaru AOKI、Shuzo FUJIMURA、Nobuo UENO、Yasuhiro HORIIKE、Yoshiya HARADA (1.Process Development Div., C850, Fujitsu Ltd.、2.Department of Chemistry, College of Arts and Science, The Univ. of Tokyo、3.Department of Material Science, Faculty of Engineering, Chiba Univ.、4.Department of Electrical Engineering, Toyo Univ.)

https://doi.org/10.7567/SSDM.1995.S-I-1-2