[S-I-1-4] Interface States at Ultrathin Chemical Oxide/Silicon Interfaces Obtained from Measurements of XPS Spectra under Biases

Hikaru Kobayashi、Yoshiyuki Yamashita、Kenji Namba、Yoshihiro Nakato、Yasushiro Nishioka (1.Department of Chemistry, Faculty of Engineering Science, and Research Center for Photoenergetics of Organic Materials, Osaka University、2.Tsukuba Research and Development Center, Texas Instruments Japan)

https://doi.org/10.7567/SSDM.1995.S-I-1-4