A New Low-Temperature Oxidation Technique by Gas Cluster Ion Beams

Makoto AKIZUKI; Jiro MATSUO; Satoru OGASAWARA; Mitsuaki HARADA; Atsumasa DOI; Isao YAMADA

doi:https://doi.org/10.7567/SSDM.1995.S-I-2-3

[S-I-2-3] A New Low-Temperature Oxidation Technique by Gas Cluster Ion Beams

Makoto AKIZUKI、Jiro MATSUO、Satoru OGASAWARA、Mitsuaki HARADA、Atsumasa DOI、Isao YAMADA (1.Microelectronics Research Center, SANYO Electric Co., Ltd.、2.Ion Beam Engineering Experimental Laboratory, Kyoto University)

https://doi.org/10.7567/SSDM.1995.S-I-2-3

1995 International Conference on Solid State Devices and Materials

[S-I-2-3] A New Low-Temperature Oxidation Technique by Gas Cluster Ion Beams