[S-I-5-2] Fluorine Doped SiO2 for Low Dielectric Constant Films in Sub-Half Micron ULSI Multilevel Interconnection

Nobuo HAYASAKA, Hideshi MIYAJIMA, Yasushi NAKASAKI, Ryota KATSUMATA (1.ULSI Research Laboratories, Toshiba Corp.)

https://doi.org/10.7567/SSDM.1995.S-I-5-2