[S-I-5-3] Formation of SiOF Films by PECVD Using (C2H5O)3SiF

H. Kito, M. Muroyama, M. Sasaki, M. Iwasawa, H. Kimura (1.Process Division, Semiconductor Company, Sony Corporation, 2.Center for Computational Science, Research Center, Sony Corporation)

https://doi.org/10.7567/SSDM.1995.S-I-5-3