Formation of SiOF Films by PECVD Using (C2H5O)3SiF

H. Kito; M. Muroyama; M. Sasaki; M. Iwasawa; H. Kimura

doi:https://doi.org/10.7567/SSDM.1995.S-I-5-3

1995 International Conference on Solid State Devices and Materials

1995年8月21日〜 1995年8月24日
International House, Osaka, Japan

[S-I-5-3] Formation of SiOF Films by PECVD Using (C2H5O)3SiF

H. Kito、M. Muroyama、M. Sasaki、M. Iwasawa、H. Kimura (1.Process Division, Semiconductor Company, Sony Corporation、2.Center for Computational Science, Research Center, Sony Corporation)

https://doi.org/10.7567/SSDM.1995.S-I-5-3

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