H2O-TOP-PECVD: A New Plasma Enhanced CVD Technology Using Alternate TEOS-Ozone Low Pressure CVD and H2O Assisted O3 Plasma Treatment

[S-I-6-2] H2O-TOP-PECVD: A New Plasma Enhanced CVD Technology Using Alternate TEOS-Ozone Low Pressure CVD and H2O Assisted O3 Plasma Treatment

Koji Kishimoto、Kou Imaoka、Ken-ichi Koyanagi、Tetsuya Homma (1.NEC Corporation, ULSI Device Development Laboratories、2.Applied Materials Japan, Inc.)