H2O-TOP-PECVD: A New Plasma Enhanced CVD Technology Using Alternate TEOS-Ozone Low Pressure CVD and H2O Assisted O3 Plasma Treatment

Koji Kishimoto; Kou Imaoka; Ken-ichi Koyanagi; Tetsuya Homma

doi:https://doi.org/10.7567/SSDM.1995.S-I-6-2

[S-I-6-2] H2O-TOP-PECVD: A New Plasma Enhanced CVD Technology Using Alternate TEOS-Ozone Low Pressure CVD and H2O Assisted O3 Plasma Treatment

Koji Kishimoto, Kou Imaoka, Ken-ichi Koyanagi, Tetsuya Homma (1.NEC Corporation, ULSI Device Development Laboratories, 2.Applied Materials Japan, Inc.)

https://doi.org/10.7567/SSDM.1995.S-I-6-2

1995 International Conference on Solid State Devices and Materials

[S-I-6-2] H2O-TOP-PECVD: A New Plasma Enhanced CVD Technology Using Alternate TEOS-Ozone Low Pressure CVD and H2O Assisted O3 Plasma Treatment