[S-I-7-4] Effect of Nitrogen Profile on Tunnel Oxynitride Degradation with Charge Injection Polarity

Tomiyuki ARAKAWA、Ryoichi MATSUMOTO、Akio KITA (1.VLSI R & D Center and LSI Process Technology Division, Oki Electric Industry Co., Ltd.)

https://doi.org/10.7567/SSDM.1995.S-I-7-4