[A-1-3] A Novel Conductance Measurement Technique for Profiling the Lateral LDD n-Doping Concentrations of Submicron MOS Devices

Steve S. Chung, G. H. Lee, S. M. Cheng, M. S. Liang (1.Department of Electronic Engineering, National Chiao Tung University, 2.Taiwan Semiconductor Manufacturing Co.)

https://doi.org/10.7567/SSDM.1996.A-1-3