[A-1-3] A Novel Conductance Measurement Technique for Profiling the Lateral LDD n-Doping Concentrations of Submicron MOS Devices

Steve S. Chung、G. H. Lee、S. M. Cheng、M. S. Liang (1.Department of Electronic Engineering, National Chiao Tung University、2.Taiwan Semiconductor Manufacturing Co.)

https://doi.org/10.7567/SSDM.1996.A-1-3