[A-3-1] Metal CVD Technology for ULSI Applications: The Aluminum Route

Andreas KNORR、Jonathan FALTERMEIER、Robert TALEVI、Heidi GUNDLACH、Kaushik Arun KUMAR、Gregory G. PETERSON、Alain E. KALOYEROS (1.New York State Center for Advanced Thin Film Technology and Department of Physics, the University at Albany-SUNY)

https://doi.org/10.7567/SSDM.1996.A-3-1