[B-4-4] Significant Effect of OH inside Silicon Chemical Oxides on AHF(Anhydrous Hydrofluoric Acid) Etching

Kouichi MURAOKA、Iwao KUNISHIMA、Nobuo HAYASAKA、Shin-ichi TAKAGI (1.ULSI Research Laboratories, TOSHIBA Corporation)

https://doi.org/10.7567/SSDM.1996.B-4-4