[B-4-4] Significant Effect of OH inside Silicon Chemical Oxides on AHF(Anhydrous Hydrofluoric Acid) Etching
Kouichi MURAOKA, Iwao KUNISHIMA, Nobuo HAYASAKA, Shin-ichi TAKAGI
(1.ULSI Research Laboratories, TOSHIBA Corporation)
https://doi.org/10.7567/SSDM.1996.B-4-4