[D-1-2] Highly Selective Wet-Etching Using Adipic Acid for Uniform Damage-Free Process of InAlAs/InGaAs HEMTs

Katsuhiko HIGUCHI、Hiroyuki UCHIYAMA、Takashi SHIOTA、Makoto KUDO、Tomoyoshi MISHIMA (1.Central Research Lab., Hitachi, Ltd.)

https://doi.org/10.7567/SSDM.1996.D-1-2