[LA-2] New Cleaning Solution; Mixture of HF/HCl and Pure Water Containing a Little Dissolved Oxygen

Yuka Hayami、Hiroki Ogawa、Miki. T. Suzuki、Yoshiko Okui、Shuzo Fujimura (1.Process development Division C850 FUJITSU LIMITED)

https://doi.org/10.7567/SSDM.1996.LA-2