[LPC-2] Chemical-Vapor-Deposition of Hydrogen-Free Silicon-Dioxide Films

Y. Uchida、S. Takei、M. Matsumura (1.Department of Electronics and Information Science, Teikyo Univ. of Sci. and Tech.、2.Department of Physical Electronics, Tokyo Institute of Technology)

https://doi.org/10.7567/SSDM.1996.LPC-2