[LPC-2] Chemical-Vapor-Deposition of Hydrogen-Free Silicon-Dioxide Films

Y. Uchida, S. Takei, M. Matsumura (1.Department of Electronics and Information Science, Teikyo Univ. of Sci. and Tech., 2.Department of Physical Electronics, Tokyo Institute of Technology)

https://doi.org/10.7567/SSDM.1996.LPC-2