[PC-1-4] Contamination-Free Physical Resist Stripping by Megasonic/IPA/Fluoride Enhanced Lift-off Processing

Takayuki JIZAIMARU、Senri OJIMA、Syunkichi OMAE、Tadahiro OHMI (1.Department of Electronic Engineering, Faculty of Engineering, Tohoku University、2.Development DIV. Nomura Micro Science Co., Ltd.)

https://doi.org/10.7567/SSDM.1996.PC-1-4