[PC-8-2] Interface States for Ultrathin Chemical Oxide Layers on Si(111) and Si(100)

Y. Yamashita、Y. Nakato、Y. Nishioka、H. Kato、H. Kobayashi (1.Department of Chemistry, Faculty of Engineering Science, and Research Center for Photoenergetics of Organic Materials, Osaka University、2.Texas Instruments Tsukuba Research and Development Center Ltd.、3.Photon Factory, National Laboratory for High Energy Physics、4.PRESTO, Research Development Corporation of Japan)

https://doi.org/10.7567/SSDM.1996.PC-8-2