[PD-1-8] Effect of Metals (Fe,Cu) on 8-nm-Thick Gate Oxide Reliability
Yoshimi SHIRAMIZU、Masaru TANAKA、Shinya YAMASAKI、Masaharu NAKAMORI、Nahomi AOTO、Hiroshi KITAJIMA
(1.ULSI Device Development Laboratories, NEC Corporation)
https://doi.org/10.7567/SSDM.1996.PD-1-8