[PD-5-4] Characteristics of AlGaAs/AlGaAs Interface after In-Situ Low-Temperature H2 Annealing and MOVPE Regrowth

Shu GOTOH、Hideaki HORIKAWA (1.Semiconductor Technology Laboratory, Oki Electric Industry Co., Ltd.)

https://doi.org/10.7567/SSDM.1996.PD-5-4