[PD-7-2] Preparation and Characterization of Iridium Oxide Thin Films by DC Reactive Sputtering

H-J. Cho、H. Horii、C. S. Kang、S. O. Park、J. W. Kim、B. T. Lee、C. S. Hwang、S. I. Lee、M. Y. Lee (1.Process Development Team 2, Semiconductor R&D Center, Samsung Electronics Co., LTD)

https://doi.org/10.7567/SSDM.1996.PD-7-2