[PD-7-2] Preparation and Characterization of Iridium Oxide Thin Films by DC Reactive Sputtering

H-J. Cho, H. Horii, C. S. Kang, S. O. Park, J. W. Kim, B. T. Lee, C. S. Hwang, S. I. Lee, M. Y. Lee (1.Process Development Team 2, Semiconductor R&D Center, Samsung Electronics Co., LTD)

https://doi.org/10.7567/SSDM.1996.PD-7-2