[Sympo.II-11] Effect of Bias Addition on the Gap-Filling Properties of Fluorinated Amorphous Carbon Thin Films Grown by Helicon Wave Plasma Enhanced Chemical Vapor Deposition
Kazuhiko ENDO、Toru TATSUMI
(1.Microelectronics Research Laboratories, NEC Corporation)
https://doi.org/10.7567/SSDM.1996.Sympo.II-11