The Japan Society of Applied Physics

[Sympo.IV-8] Development of an In-Situ Method of Fabricating Artificial Atom Structures on the Si(100) Surface

Tomihiro HASHIZUME, Seiji HEIKE, Mark I. LUTWYCHE, Satoshi WATANABE, Yasuo WADA (1.Advanced Research Laboratory, Hitachi, Ltd.)

https://doi.org/10.7567/SSDM.1996.Sympo.IV-8