[A-12-2] Fraction of Interstitialcy Component of Phosphorus and Antimony Diffusion in Silicon

Toshio Takagi、Takashi Shimizu、Satoru Matsumoto、Yoshiyuki Sato、Eisuke Arai、Takao Abe (1.Faculty of Sicence and Technology, Keio University、2.NTT LSI Laboratories、3.Nagoya Institute of Technology、4.SEH R&D Center, Shin-Etsu Handotai Co., Ltd.)

https://doi.org/10.7567/SSDM.1997.A-12-2