[A-12-2] Fraction of Interstitialcy Component of Phosphorus and Antimony Diffusion in Silicon

Toshio Takagi, Takashi Shimizu, Satoru Matsumoto, Yoshiyuki Sato, Eisuke Arai, Takao Abe (1.Faculty of Sicence and Technology, Keio University, 2.NTT LSI Laboratories, 3.Nagoya Institute of Technology, 4.SEH R&D Center, Shin-Etsu Handotai Co., Ltd.)

https://doi.org/10.7567/SSDM.1997.A-12-2