[A-5-2] Calibration of TCAD Models for High Dose Impurity Diffusion

Osamu Nishio、Masahiro Takenaka、Eiji Aoki、Norio Mizukoshi、Katsumasa Fujii (1.VLSI Development Laboratories, SHARP Corporation)

https://doi.org/10.7567/SSDM.1997.A-5-2