[A-5-7] Deactivation of Boron in Highly Boron-Doped Silicon

I. Mizushima, Y. Mitani, M. Koike, M. Yoshiki, M. Tomita, S. Kambayashi (1.Microelectronics Engineering Laboratory, R&D Center Toshiba Corporation)

https://doi.org/10.7567/SSDM.1997.A-5-7