[A-5-7] Deactivation of Boron in Highly Boron-Doped Silicon

I. Mizushima、Y. Mitani、M. Koike、M. Yoshiki、M. Tomita、S. Kambayashi (1.Microelectronics Engineering Laboratory, R&D Center Toshiba Corporation)

https://doi.org/10.7567/SSDM.1997.A-5-7