Fine-Grained SrBi2Ta2O9 Thin Films by Low Temperature Annealing

Nobuhito OGATA; Yasuyuki ITO; Kazuya ISHIHARA; Masaya NAGATA; Hitoshi URASHIMA; Akira OKUTOH; Shinobu YAMAZAKI; Shun MITARAI; Jun KUDO

doi:https://doi.org/10.7567/SSDM.1997.B-2-3

1997 International Conference on Solid State Devices and Materials

Sep 16, 1997 - Sep 19, 1997
ACT CITY Hamamatsu, Hamamatsu, Japan

[B-2-3] Fine-Grained SrBi2Ta2O9 Thin Films by Low Temperature Annealing

Nobuhito OGATA, Yasuyuki ITO, Kazuya ISHIHARA, Masaya NAGATA, Hitoshi URASHIMA, Akira OKUTOH, Shinobu YAMAZAKI, Shun MITARAI, Jun KUDO (1.Functional Devices Laboratories, Sharp Corporation)

https://doi.org/10.7567/SSDM.1997.B-2-3

▲