[B-2-5] New Low Temperature Processing of MOCVD-Bi4Ti3O12 Thin Films Using BiOx Buffer Layer

Takeshi KIJIMA, Maho USHIKUBO, Hironori MATSUNAGA (1.Functional Devices Laboratories, SHARP Corporation)

https://doi.org/10.7567/SSDM.1997.B-2-5