[B-5-1] Evaluation of Electron Trap Levels in SIMOX Buried Oxide by Transient Photocurrent Spectroscopy

Yoshinao Miura, Kouichi Hamada, Tomohisa Kitano, Atsushi Ogura (1.Microelectronics Research Laboratories, NEC Corporation, 2.ULSI Device Development Laboratories, NEC Corporation)

https://doi.org/10.7567/SSDM.1997.B-5-1