[C-6-8] Reactive Ion Beam Etching and Overgrowth Process for Fabrication of InGaN Inner Stripe Laser Diodes

Shin-ya Nunoue, Masahiro Yamamoto, Mariko Suzuki, Chiharu Nozaki, Joji Nishio, Lisa Sugiura, Masaaki Onomura, Kazuhiko Itaya, Masayuki Ishikawa (1.Advanced Semiconductor Devices Research Laboratories, R&D Center, Toshiba Corporation)

https://doi.org/10.7567/SSDM.1997.C-6-8