[D-8-2] Improved Diffusion Barrier Capability of Thin WSiN Film by RF Bias Application during ECR Plasma Nitridation

A. Hirata, K. Machida, S. Maeyama, Y. Watanabe, H. Kyuragi (1.NTT System Electronics Laboratories, 2.NTT Basic Research Laboratories)

https://doi.org/10.7567/SSDM.1997.D-8-2