[D-8-2] Improved Diffusion Barrier Capability of Thin WSiN Film by RF Bias Application during ECR Plasma Nitridation

A. Hirata、K. Machida、S. Maeyama、Y. Watanabe、H. Kyuragi (1.NTT System Electronics Laboratories、2.NTT Basic Research Laboratories)

https://doi.org/10.7567/SSDM.1997.D-8-2