[A-3-2] Ultrathin Nitride/Oxide (N/O) Gate Dielectrics for p+-poly Gated PMOSFETs Prepared by a Combined Remote Plasma Enhanced CVD/Thermal Oxidation Process

Yider WU、Gerald LUCOVSKY (1.Departments of Electrical and Computer Engineering, North Carolina State University、2.Departments of Physics, Materials Science and Engineering, and Electrical and Computer Engineering, North Carolina State University)

https://doi.org/10.7567/SSDM.1998.A-3-2