Dual Gate Oxide Process Integration for High Performance Embedded Memory Products

Hideo Oi; Yasuhito Shiho; Peter Chen; Navakant Bhat

doi:https://doi.org/10.7567/SSDM.1998.A-3-3

1998 International Conference on Solid State Devices and Materials

1998年9月7日〜 1998年9月10日
International Conference Center Hiroshima, Hiroshima, Japan

[A-3-3] Dual Gate Oxide Process Integration for High Performance Embedded Memory Products

Hideo Oi、Yasuhito Shiho、Peter Chen、Navakant Bhat (1.Consumer Systems Group and Networking & Computing Systems Group, Semiconductor Products Sector, MOTOROLA Inc.)

https://doi.org/10.7567/SSDM.1998.A-3-3

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