Conformal Step Coverage of (Ba, Sr)TiO3 Films Prepared by Liquid Source CVD Using Ti(t-BuO)2(DPM)2

Takaaki Kawahara; Shigeru Matsuno; Mikio Yamamuka; Masayoshi Tarutani; Takehiko Sato; Tsuyoshi Horikawa; Fusaoki Uchikawa; Kouichi Ono

doi:https://doi.org/10.7567/SSDM.1998.B-2-5

1998 International Conference on Solid State Devices and Materials

1998年9月7日〜 1998年9月10日
International Conference Center Hiroshima, Hiroshima, Japan

[B-2-5] Conformal Step Coverage of (Ba, Sr)TiO3 Films Prepared by Liquid Source CVD Using Ti(t-BuO)2(DPM)2

Takaaki Kawahara、Shigeru Matsuno、Mikio Yamamuka、Masayoshi Tarutani、Takehiko Sato、Tsuyoshi Horikawa、Fusaoki Uchikawa、Kouichi Ono (1.Advance Technology R & D Center, Mitsubishi Electric Corporation)

https://doi.org/10.7567/SSDM.1998.B-2-5

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