[B-3-4] High-Performance EEPROMs Using N- and P-Channel Poly-Si TFTs with ECR N20-Plasma Oxide

Nae-In Lee, Jin-Woo Lee, Hyoung-Sub Kim, Chul-Hi Han (1.Department of Electrical Engineering, KAIST, 2.Semiconductor R & D Center, Samsung Electronics Co. Ltd.)

https://doi.org/10.7567/SSDM.1998.B-3-4