[C-2-4] Fabrication of High-Resolution and High-Aspect-Ratio Pattering on a Stepped Substrate by Scanning Probe Lithography Using a Multilayer-Resist System

Masayoshi Ishibashi、Nami Sugita、Seiji Heike、Hiroshi Kajiyama、Tomihiro Hashizume (1.Advanced Research Laboratory, Hitachi, Ltd.)

https://doi.org/10.7567/SSDM.1998.C-2-4