[D-2-6] Performance Considerations in Using High-k Dielectrics for Deep Sub-Micron MOSFETs

A. Inani, V. Ramgopal Rao, B. Cheng, M. Cao, P. V. Voorde, W. Greene, J. C. S. Woo (1.EE Department, University of California, 2.ULSI Research Laboratory, Hewlett-Packard Laboratories)

https://doi.org/10.7567/SSDM.1998.D-2-6