[D-2-6] Performance Considerations in Using High-k Dielectrics for Deep Sub-Micron MOSFETs

A. Inani、V. Ramgopal Rao、B. Cheng、M. Cao、P. V. Voorde、W. Greene、J. C. S. Woo (1.EE Department, University of California、2.ULSI Research Laboratory, Hewlett-Packard Laboratories)

https://doi.org/10.7567/SSDM.1998.D-2-6