[A-1-3] Characteristics of Dual Polymetal (W/WNx/Poly-Si) Gate CMOS for 0.1 μm DRAM Technology

Yong-Hae Kim, Sung-Keun Chang, Seon-Soon Kim, Jun-Gi Choi, Sang-Hee Lee Dae-Hee Hahn, Hyung-Duck Kim (1.Semiconductor Advanced Research Division, Hyundai Electronics Industries)

https://doi.org/10.7567/SSDM.1999.A-1-3