[A-11-1] Effects of Hydrogen and Deuterium Annealing on Plasma Process-Induced Damages

C. G. Ahn、J. H. Kim、Y. K. Kim、Y. H. Lee、B. K. Kang (1.Pohang University of Science and Technology, Department of Electrical Engineering、2.SAMSUNG Electronics Co. Ltd., Semiconductor Business, ASIC Division)

https://doi.org/10.7567/SSDM.1999.A-11-1