[B-1-3] Anomalous Hot Carrier Degradation of nMOSFETs with an Ultra-Shallow Source/Drain Extension

Kaori Nakamura、Eiichi Murakami、Shin'ichiro Kimura (1.ULSI Research Department, Central Research Laboratory, Hitachi Ltd.)

https://doi.org/10.7567/SSDM.1999.B-1-3