[B-12-1] Copper Metallization for High-Speed ECL-CMOS LSI's

N. Ohashi、T. Saito、T. Hashimoto、J. Noguchi、T. Imai、K. Sasajima、H. Yamaguchi、N. Owada (1.Device Development Center, Hitachi, Ltd.)

https://doi.org/10.7567/SSDM.1999.B-12-1