[B-12-1] Copper Metallization for High-Speed ECL-CMOS LSI's

N. Ohashi, T. Saito, T. Hashimoto, J. Noguchi, T. Imai, K. Sasajima, H. Yamaguchi, N. Owada (1.Device Development Center, Hitachi, Ltd.)

https://doi.org/10.7567/SSDM.1999.B-12-1